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Plasma Pod

New for 2010 the Plasma Pod offers customers a benchtop plasma etching system.

The Plasma Pod is equipped with up to 3 gas lines, 300 watt RF generator, automatic matching unit, turbo molecular pump , automatic pressure control and full PLC control unit with touch screen interface.

System dimensions are 560 mm x 390 mm x 620 mm.

The system has an aluminium chamber with a water cooled electrode which can accept up to a 125 mm diameter substrate.

Click here for the full PDF brochure.


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