New for 2010 the Plasma
Pod offers customers a benchtop plasma etching system.
The Plasma Pod is equipped
with up to 3 gas lines, 300 watt RF generator, automatic matching
unit, turbo molecular pump , automatic pressure control and full
PLC control unit with touch screen interface.
System dimensions are
560 mm x 390 mm x 620 mm.
The system has an aluminium
chamber with a water cooled electrode which can accept up to a 125
mm diameter substrate.
here for the full PDF brochure.
here for the full PDF specification sheet.